Used AXCELIS / FUSION Summit XT #9235774 for sale

AXCELIS / FUSION Summit XT
ID: 9235774
Wafer Size: 12"
Vintage: 2005
Rapid Thermal Processor (RTP), 12" 2005 vintage.
AXCELIS / FUSION Summit XT is an advanced exposure equipment designed to meet the specialized needs of the semiconductor industry. This system allows the production of the most demanding microstructures and device features, with the highest resolution and overlay accuracy available. It features an ultra-high throughput plasma source that enables ion implantation speed up to 800nm/min and an unmatched imaging unit that allows the highest levels of resolution and accuracy. FUSION Summit XT is capable of exposing a wide range of substrates, ranging from bulk silicon wafers to SynGap™ wafers containing ultra-thin nanolayers. The machine includes an advanced proprietary image analysis and enhancement software, which allows for the maintenance of extremely small feature sizes while ensuring the highest level of substrate planarity. It also features an advanced rapid stage automation tool that offers high-level repeatability, allowing users to quickly adapt to changes in fabrication models without sacrificing accuracy. The asset can be further enhanced by the addition of additional clusters and modules, including a gas delivery model and an optional plasma excitation source. AXCELIS Summit XT has an intuitive, user-friendly touchscreen interface allowing easy and efficient recipe development, operation, and equipment monitoring. It also has an integrated hard drive, where recipe settings and system log data can be stored. In addition, the unit is equipped with an embedded machine control processor, which allows for automated control and real-time tool monitoring. This machine is built for use in a 24/7 production environment, offering high levels of reliability and robustness. It utilizes a specialized air conditioning asset to maintain the required temperature and humidity, and is environmentally and ESD compliant for sensitive devices. Summit XT is the perfect solution for high-volume semiconductor production. With its high-speed imaging resolution and top-of-the-line substrate-handling capabilities, this model is a must-have for any cutting-edge wafer fabrication facility.
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