Used AXCELIS / FUSION UV-150PC #9144789 for sale

AXCELIS / FUSION UV-150PC is an exposure equipment designed to provide efficient photolithography processes for advanced device manufacturing. Integrating advanced imaging technology, FUSION UV-150PC is able to ensure quality and productivity in photomask manufacturing, semiconductor, and other related processes. The exposure system is designed to offer reliable exposure capability over a wide process window that meets the requirements of advanced free-form photomask patterning. It is the optimal unit for next-generation photomask development as well as for applications such as resolution enhancement technologies (RET) and hardmask exposure. AXCELIS UV-150PC offers a combination of features that improve productivity and yield. Its autofocus machine automatically compensates for topographical differences in a substrate, which improves the accuracy and repeatability of the exposure tool. Its autofocus technology can digitally remap exposure data to address minor defects during the exposure phase. Furthermore, its advanced imaging technique offers high-speed exposure rate and uniformity. UV-150PC also has an integrated thermal management asset. With its built-in temperature control model, the exposure equipment ensures consistent photomask patterns without clipping. In addition, its advanced optical system offers optimized spectral uniformity and offers excellent parallelism in exposure accuracy throughout the exposure process. Finally, its improved vacuum architecture ensures stable imaging and provides excellent image retention. AXCELIS / FUSION UV-150PC is also designed to minimize material usage, and its optimised grid technology helps reduce particle generation. It also features a configurable scan unit that maximises scan speed and minimises artefacts on the photomask. Additionally, its fully configurable auto-track machine allows for exact adjustment of focus and dose parameters according to the requirements of the application. FUSION UV-150PC is an advanced exposure tool offering excellent productivity, accuracy, and efficiency for various photolithography processes. Its advanced imaging asset ensures highly accurate and precise exposures in a wide range of applications, which can help minimize material waste and increase yields. Its sophisticated built-in temperature control model can provide excellent image quality while its innovative vacuum architecture ensures optimal stability and image retention. Finally, its high-speed scanning capabilities and auto-track equipment ensure high throughput and repeatable results.