Used AXCELIS / FUSION UV #9145265 for sale

AXCELIS / FUSION UV
Manufacturer
AXCELIS / FUSION
Model
UV
ID: 9145265
Wafer Size: 8"
Bake systems, 8".
AXCELIS / FUSION UV is an advanced equipment for exposing ultraviolet (FUSION UV) light sensitive materials. It is a lithography machine designed for fabrication of semiconductor devices and wafers. AXCELIS UV system is a resist exposure unit that uses a UV lamp with a projection optics to deliver a variety of exposure patterns. The lamp power and light intensity are adjustable to enable precise exposure of the photoresist. It is also equipped with an anti-reflective coating (ARC) chamber to reduce reflections from the resist surface, resulting in greater image clarity. The machine also uses an automated stepper/scanner to ensure uniform exposure of the substrate. AXCELIS / FUSION UV tool is capable of producing exposures for a wide range of photomasks, varying from small-size to large-size patterns with high accuracy and repeatability. The asset is also equipped with an advanced topography matcher which allows customized exposure patterns to be transferred directly onto the surface of substrates. The stepper/scanner ensures precise and repeatable pattern transfer across multiple substrates. FUSION UV model is equipped with an array of safety features. These include temperature and safety chambers to protect personnel from contact with high intensity AXCELIS UV radiation. The safety-interlock equipment is designed to instantly shut down the system if exposed personnel enter the exposure area. The unit also includes a bio-scanne r to detect any personnel access in the front and rear walls of the exposure area. UV machine is a reliable and versatile exposure tool for lithography processes in semiconductor device fabrication. The asset is capable of providing small- to large-size image exposure and pattern transfer with accuracy and repeatability. Its safety features will ensure that personnel are kept safe from dangerous AXCELIS / FUSION UV radiation. The advanced model provides an efficient, accurate, automated, and reliable tool for semiconductor lithography processes.
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