Used AXCELIS / FUSION UV #9257126 for sale

AXCELIS / FUSION UV is a high-throughput exposure equipment designed for the photolithography process used in semiconductor manufacturing. It utilizes deep FUSION UV excimer laser light sources with wavelengths of 193 nanometers to achieve ultra-fine features with high repeatability. The system is capable of exposing substrates of various sizes and materials such as silicon, SiGe, quartz, or glass up to 300 mm and is optimized for high-precision imaging. Additionally, the unit's advanced advanced optics and imaging techniques allow for resolution down to nano-range and line widths of below 15nm. The machine is capable of providing tailored exposures tailored to match the needs of various processes such that each layer of the substrate can be accurately and precisely exposed. It is particularly useful during the development stages of a project, providing a flexible platform for prototyping and testing new designs. The tool also features real-time imaging optimization technology, enabling accurate and repeatable exposure results. AXCELIS UV also boasts a state-of-the-art asset controller with intuitive graphical user interface, allowing for easy changing of settings and process optimization. In addition, the model can be integrated into existing fabs and is customizable to fit specific needs. The equipment includes a series of safety features. The scanning head is equipped with a safety shield and the system offers multiple layers of protection for personnel and the work environment. UV is designed to protect the environment with environmentally friendly processes and materials. The unit is designed to optimize throughput and achieve consistent results across all exposures. This is accomplished through a combination of a highly efficient power supply, advanced control algorithms, and sophisticated optics. The laser light sources utilized are designed for long-term use with minimal maintenance and a stable output. Overall, AXCELIS / FUSION UV is an efficient and reliable exposure machine which provides high-precision imaging with customizable exposure profiles and provides optimized throughput. It is a versatile and cost-effective solution for any semiconductor manufacturing process.