Used AXCELIS Microlite #9293673 for sale

AXCELIS Microlite is an advanced exposure equipment designed for sub-micron wafer patterning. The system is engineered for the most advanced photolithography processes, offering superior numerical aperture and magnification for high resolution patterning in sub-200nm devices. With its proprietary precision opto-mechanics, high contrast optics and closed loop imaging algorithms, Microlite provides superior aberration correction accuracy compared to conventional lithography systems. Advanced positioning assemblies along with an off-axis mounted projection lens enable precise movement and control of the optical components of this unit. This ensures that the smallest fixations and adjustments are accurately done resulting in superior pattern alignment. Its superior optics and advanced microscope technology make it the ideal choice to print micro patterns on semiconductor wafers. The machine is suitable for a wide range of applications such as photomask generation, nano-imprint lithography and other advanced lithography processes. Its compact chamber and superior vacuum performance enables it to handle aggressive gas chemistries in the lithography process. It is also capable of esposing high contrast features, allowing for accurate soft image generation in molecular-scale prototyping. Another key feature of AXCELIS Microlite tool is its high resolution projection optics. The asset is equipped with a 100 µm-resolution projection optics that is capable of delivering unique imaging performance for the smallest feature sizes. This enables a wide range of features to be exposed, including lines and patterns that are just a few nanometers in size. The model offers superior pattern uniformity across a wide range of wafer substrates including quartz, metal and dielectric materials. Its uniformity is further enhanced by its tight temperature, coating and vibration control enabling batch-wise and highly precise device fabrication processes. Microlite also comes with a built-in equipment for quality control and OPC validation, which allows it to detect even the most subtle variations in the lithography process. In conclusion, AXCELIS Microlite is an advanced and versatile exposure system that offers the high resolution required for nano-imprint lithography and other advanced photolithography processes. Using its built-in image correction algorithms and precision optics, it enables superior pattern uniformity across a wide range of wafer substrates. As a result, it is an excellent choice for creating sub-micron semiconductor devices and other complex nanostructures.