Used AXCELIS Microlite #9388038 for sale

AXCELIS Microlite
Manufacturer
AXCELIS
Model
Microlite
ID: 9388038
Lithography system.
An AXCELIS Microlite exposure equipment is an advanced and highly precise device used for lithography processes. It is designed specifically for the production and fabrication of semiconductor wafers, which often require intensive and detailed work. It combines the accuracy and repeatability of an aerial imaging system along with a high-end optical unit to provide the best possible performance. Microlite is a digital exposure machine that uses a number of components, including a stepper, pattern generator, stage, alarm tool, camera and other peripherals to image patterns on a wafer. The asset utilizes an advanced linear stage mounted directly onto the imaging model to create a highly stable platform for imaging. The stage has four axes of motion and is configured with two levels of automation, allowing for high accuracy and repeatability. AXCELIS Microlite is comprised of several components, each of which work together to create the perfect exposure environment. The heart of the equipment is the pattern generator, which is capable of producing patterns with high-precision and accuracy. The stage is designed to be compact and robust, so that users can cover a large surface area with great accuracy. Additionally, the camera and high-end optics are essential for providing additional control and enhanced imaging capabilities. Finally, the alarm system provides a layer of protection to the unit in case of unexpected circumstances. It monitors the status of the machine components and can alert operators of any potential issues, which helps to prevent malfunctioning or emergency situations. Overall, Microlite tool is an advanced and reliable exposure asset that can be configured with a variety of components to create a powerful lithography model. Its impressive accuracy and precision makes it the perfect choice for advanced semiconductor manufacturing. It provides accuracy and repeatability on a grand scale and can be used to quickly and easily produce many highly detailed and intricate patterns on wafers.
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