Used COLIGHT 1230 #293589867 for sale

COLIGHT 1230 is an exposure equipment used for a variety of lithography and processing applications in the manufacture of wafers and optical components. The system is capable of providing various types of exposure such as: ultraviolet (UV), Visible, X-Ray, Deep Ultraviolet (DUV) and High Vacuum (HV). The unit design enables a broad range of exposures to be performed, enabling users to quickly and accurately produce a wide variety of components, including semiconductors, optoelectronic devices, MEMS, and optical lenses. The machine incorporates a 1230mm x 1220mm stage and can support a variety of substrates up to 300mm. The motion mechanics of stages are composed of both air bearings and Linear Synchronous Motors (LSM) providing consistent and repeatable motion control. The high stability of the stage ensures uniform exposure across the wafer. The tool utilizes powerful controllers and a closed loop feedback asset for precise beam positioning and exposure. 1230 has a modular architecture with separate modules for optics, illumination, and control. This modular design allows for the installation of various optics and illumination sources to meet the application requirements of the user. The model can be configured with up to four exposure heads and an optional robotic handler. The exposure heads contain a variety of optics and sources, including Imbert-Friedrich illumination, Spectral Selection, Fourier Filtering, Cradle and Step Selection, and On-Axis optical systems, making the equipment suitable for a wide range of lithography and processing applications. COLIGHT 1230 is designed with a variety of safety features to ensure operator safety. It features safety interlocks, emergency-stop buttons, and barrier guards with interlocked access doors. It also features a variety of metrology features such as wafer mapping, wafer counting, and sub-micron alignment, providing the user with precise control over their exposure process. The system is user-friendly, with an intuitive graphical user interface for easy parameter setup and control. 1230 is a highly capable exposure unit suitable for builders of advanced optical components, including semiconductors, MEMS devices, and optical lenses. It offers fast and accurate exposure to provide uniform and repeatable results, allowing users to produce high-quality components quickly and efficiently.