Used DNS / DAINIPPON EEW-622-8 #138780 for sale

DNS / DAINIPPON EEW-622-8 is a state-of-the-art exposure equipment designed for advanced research applications, including microelectronic device fabrication. DNS EEW-622-8 is based on direct positive-tone imaging (DPI) technology, which utilizes a modified electron beam evaporation technique to precisely and accurately expose thin layers of wafer material. The direct positive-tone imaging process allows users to make different types of contacts on patterned substrates, as well as the ability to create extremely thin and complex patterned devices. DAINIPPON EEW-622-8 includes a range of technologies to optimize exposure performance, such as an advanced scanning system and advanced emitter integration. The scanning unit allows the user to control the size, shape, and direction of an electron beam, enabling exposures at both high and low magnifications. The emitter integration technology allows the machine to produce highly optimized images, maximizing pattern resolution and device performance. The tool is equipped with a highly efficient evaporation source, providing the necessary energy for exposure. This source operates by applying a negative electric potential to the layer that is to be exposed. This allows a beam of electrons to evaporate the material, leaving behind patterns of charged ions that form the pattern of the device. EEW-622-8 also features a comprehensive metrology suite, which can be used to measure and monitor the performance of the exposure asset. This metrology suite enables measurements of the electron beam size and shape, beam current, drift, and resolution. It also allows users to monitor the charge levels within the exposed layers. The model also offers high throughput capabilities, with exposures taking place at high-throughput rates in a fraction of a second. This feature significantly increases the versatility of the equipment, allowing users to quickly and efficiently produce a variety of different patterns. Overall, DNS / DAINIPPON EEW-622-8 is a powerful exposure system that enables users to make precise and accurate patterns on small and complex substrates. With its comprehensive metrology suite, high throughput capability, and advanced emitter integration technology, users can produce high quality devices with improved performance.