Used DS SEMICON DS 141 #293637840 for sale

DS SEMICON DS 141 is an advanced automated wafer exposure equipment designed for photomask processing in semiconductor IC (Integrated Circuit) manufacturing. The system is suitable for both photolithography and ashing/blowing processes. DS 141 is composed of a main unit, three servomotors, a stepper motor, an X/Y robot and other components. The main unit of the unit provides the hardware and software control of the exposure and cleaning process. It is responsible for controlling the stepper and servomotors and the X/Y robot. The stepper motor drives a wafer chuck assembly which is used for transferring the wafers during processing. The 3 servomotors control the X, Y and Z axis movements, which are used for positioning the mask and substrate in the exposure chamber. The X/Y robot transfers the substrate from the load locks to the exposure chamber during processing. DS SEMICON DS 141 features a high resolution imaging machine which can handle exposures from both the photomask side and the wafer side. The imaging tool is composed of a reticle and wafer chuck, two imagers and two scanner boards that monitor the imaging asset's performance. The reticle is used to locate the pattern on the photomask and can be moved in the X, Y and Z axis. The wafer chuck is used to hold the substrate during processing, and can also be moved in the X, Y and Z axis. The model is equipped with an ultra high vacuum chamber which is used to expose the wafer at low vacuum pressure to minimize the contamination of the substrate. The equipment is also equipped with an MFC (Mass Flow Controller), a pressure controller and an ion gauge which measures the pressure inside the exposure chamber. The system also features an irradiation unit which consists of three xenon lamps with a total power of 625 watts. DS 141 has an automatic process and data archiving machine, which allows for the remote control, and monitoring of the exposure process. The tool also provides a diagnostics and fault detection asset which displays the model's status in real time. The equipment can store up to 500 recipes and process up to 1,000,000 wafers per process cycle. In conclusion, DS SEMICON DS 141 is an advanced automated wafer exposure system which features high resolution imaging, an ultra high vacuum chamber, an MFC and an irradiation unit amongst other components, making it suitable for photomask processing and other high-level semiconductor IC manufacturing processes.