Used ELECTRON VISION / AMAT / APPLIED MATERIALS EC-30200-AT11 #138799 for sale

ELECTRON VISION / AMAT / APPLIED MATERIALS EC-30200-AT11 is an advanced exposure equipment designed by AMAT that provides superior performance in lithography/etching/nanofabrication applications. This system features a vacuum chamber, a laser-illuminated projection unit, and a high-speed scan platform for controlling the process. AMAT EC-30200-AT11 is capable of supporting the widest range of wafer diameters, from 4 inches up to 8 inches (100mm to 200mm). The machine utilizes multiple photon lasers, which can precisely control the light intensity for lithography and etching applications. These lasers can produce highly uniform light intensity and high fidelity images with a resolution of up to 0.25um/1000 lines/mm. The high-speed scan platform featured with this tool enables it to perform photolithography processes at speeds up to 1kHz. This allows for a much faster throughput while ensuring higher uniformity and accuracy in the process. The asset also features a 256-zone interferometric metrology model that allows for repeatable measurements and precise processing across the wafers. ELECTRON VISION EC-30200-AT11 utilizes a unique combination of specialty gases and advanced diffusion mechanisms for improved etch performance. This includes HF-based gases, mixtures of fluorocarbons and oxygen, O2, CF4, CHF3, CF6, CF2, CO2, and other specialty gases. The equipment also features an advanced chemical injection system to precisely control the pH levels and an automated gas selection unit to customize the gas mixture surface conditions. APPLIED MATERIALS EC-30200-AT11 also features an advanced automation machine that provides control and process monitoring. This includes an embedded control tool with a display interface allowing operators to monitor and adjust the processes remotely. It also features a high-speed network connection to facilitate data transfer and exchange between the asset controller and other apparatus. In conclusion EC-30200-AT11 is a highly advanced exposure model designed to provide outstanding performance in lithography, etching, and nanofabrication applications. By utilizing multiple photon lasers, a high-speed scan platform, and a variety of specialty gases and chemical injection systems, this equipment provides precise and repeatable results for a wide range of wafer diameters. Through the advanced automation system, operators are able to access remote control and process monitoring capabilities.