Used ELECTRON VISION ElectronCure 30X #9191672 for sale

ELECTRON VISION ElectronCure 30X is a powerful and reliable exposure equipment used for lithography processes. It can expose with both deep UV and electron beam lithography techniques. It has a unique combination of an electron-beam and a mercury lamp source. It offers high resolution and good focus stability, making it an excellent choice for a wide range of microelectronic applications. ElectronCure 30X offers superior depth of focus (DOF) performance. The DOF is the area which can be exposed within the designed exposure dose by the electron beam and the mercury lamp. The DOF range of ELECTRON VISION ElectronCure 30X is incredibly wide, allowing for a range of exposures up to 0.3 µm with the electron beam and 0.7 µm with the mercury source. The source flux of ElectronCure 30X is programmable and this provides a high degree of control over the exposure dose and it also allows for the adjustment of the electron beam and the lamp intensity during an exposure process. It also has an advanced auto-focusing option which allows for fast scanning around an area and accurate focusing. This ensures good alignment between the projected design and the substrate, making it an ideal option for both existing and new applications. The system also provides excellent dose uniformity, meaning the dose can be adjusted in a uniform manner even when working with challenging designs. It also uses a software package for better control over the exposure process and improved batch process ability. This ensures easy and accurate data transfer between different design resources and the production floor. ELECTRON VISION ElectronCure 30X is a stable, reliable and robust unit that provides the user with the highest quality images with the most consistent results. It offers smooth operation, superior accuracy and repeatability, making it a great choice for both existing and new output requirements. In terms of resolution and focus stability, this machine is one of the most advanced and versatile exposure systems available today. It can be used for most of the lithography processes, from simple 1D line grinding to complex 3D patterns.