Used ELITE ELC 4000 #293593206 for sale

ELITE ELC 4000 is an advanced exposure equipment, which offers superior flexibility in lithography design and production. This system is ideal for advanced lithography applications requiring high throughput, precision, and rapid development. The unit integrates an array of components and features enabling cost-effective, reliable performance. ELC 4000 is able to employ a range of exposure techniques, including mask projection, step and repeat, static, and variable dose. The machine has been designed for optimized throughput and is capable of forming consistent images on large substrates or working spaces. The tool can support large wafer sizes for production lithography and HDI, and is ideal for the fabrication of highly complex printed circuit boards and displays. The asset is configured with a high-resolution camera, an ergonomic imaging model, ans advanced mask stage and a highly efficient light source. The camera is capable of low noise, high dynamic range imaging for superior resolution. The imaging equipment is designed for reduced loading and unloading time, and includes a robust library of imaging algorithms. The mask stage has been developed for improved accuracy, and includes highly advanced motors and optical feedback systems. The efficient light source uses synchronic halogen lamps, which provide extended lifetime and reliable intensity. ELITE ELC 4000 is user-friendly and incorporates features that provide real-time feedback and automation. The system interfaces with ESI Ltd's suite of software, offering enhanced process control as well as comprehensive data capture and analysis functionality. Operators may select varous scan template settings via touchscreen control, and automated alignment allows for quick process setup and reduced scrap. Additionally, the unit has a modular frame design for accommodating varying wafer sizes. ELC 4000 offers versatile, economical lithography solutions for a range of production applications. Its design ensures maximum productivity and efficiency, while its superior imaging capabilities aid in achieving high-precision lithography results.