Used EVG / EV GROUP 601 #9402075 for sale

EVG / EV GROUP 601 Mask Aligner is a high-precision mask aligner designed to be used as part of the multi-processing suite in the fabrication of advanced photomasks. With a substrate size of up to 200mm x 250mm and alignment accuracy of up to 60 nanometers (nm), this mask aligner is well-equipped to deal with even the most delicate and sensitive photomasks. EVG 601 Mask Aligner was specifically designed for fabrication processes that require precise lithographic alignment of a patterned photomask on a substrate. The mask aligner is equipped with dual-stage alignment markings and real-time imaging for maximum accuracy, ensuring that the photomask is accurately aligned with the substrate. Its two-dimensional precision stage uses piezoelectric drive technology to provide nanometer-level step resolution and offers positional repeatability of 10 nm. EV GROUP 601 Mask Aligner can accommodate wafers of up to 200 mm diagonal in size, and its alignment system is adjustable to accommodate different shapes of photomasks. 601 Mask Aligner is an excellent choice for advanced lithography processes such as exposing and developing masks and reticles, as well as photomask pre- and post-processing. Additionally, the mask aligner is equipped with an on-board navigation system that provides automatic movement between alignment marks and enables faster alignment times. The navigation system also ensures faster and more accurate substrate-to-mask alignment. EVG / EV GROUP 601 Mask Aligner is a versatile and reliable mask aligner that can be used in a range of lithographic processes. The mask aligner is capable of delivering high-precision alignment, fast processing speeds, and improved yield, making EVG 601 an ideal choice for photomask processing.