Used EXFO / EFOS 100SS #9061200 for sale

EXFO / EFOS 100SS is a state-of-the-art exposure equipment designed to deliver superior accuracy and repeatability for advanced lithography process development. This system provides optimized exposure of slit exposure masks using a step and repeat x-y mask placement unit with a wide dynamic range. EXFO 100SS utilizes a high-end floating-stage exposure machine with improved positional accuracy and stability during exposure. This tool is ideal for high resolution direct write applications such as miniaturization due to its outstanding speed and repeatability. EFOS 100SS exposure asset employs a programmable stage, which facilitates the flexibility for automated exposure of different slit exposure masks. The model's slit exposure capability involves an alignment equipment which collimates the beams' divergent axial components to form linear slit images on the wafer. This ensures that the slit image is accurately positioned on the wafer with minimal change in the size or shape. To further ensure superior results, the system has an optically-aligned dual illumination unit with light sources from halogen and Laser sources with broad bandwidths. This allows for any of a range of wavelength illumination options which might be required for the exposure. The dual-source illumination also enables finer control over the exposure dose and accurate focus tracking throughout the exposure process. 100SS also provides the advantage of fast scan speeds over a wide range of exposures due to its dynamic slit scanning capabilities. The slit scanning feature allows the machine to make multiple exposures at different areas of a wafer in quick succession and in a programmable sequence. This ensures high throughput in a process that involves multiple slit exposures. Furthermore, the tool is designed with a secure housing and airlock asset for a cleanroom environment. The airlock ensures contamination-free exposure of tested devices, and the model is equipped with a Class 1-1000 dust filter. In conclusion, EXFO / EFOS 100SS exposure equipment sets the industry standard for advanced lithography process development due to its superior accuracy and repeatability. Its advanced slit exposure capability and optically-aligned dual illumination system provide the flexibility to accurately expose any wavelength. The fast scan speeds and Class 1-1000 dust filter enable increased throughput and a contamination-free environment.