Used EXFO / EFOS A4000 #142518 for sale

EXFO / EFOS A4000 exposure equipment is an advanced system designed to ensure precise control over exposure during semiconductor fabrication. This unit offers an excellent level of accuracy and repeatability, making it an ideal choice for any application that requires a precise level of control over exposure. EXFO A4000 exposure machine consists of a mechanical stage, a liquid crystal display (LCD) controller, a data management tool, a CCD camera and a photomask. The mechanical stage is capable of precise positioning, making it capable of accurately exposing the photomask to the desired locations. The LCD controller allows the user to easily control the exposure settings, such as exposure time and intensity. The data management asset is designed to store the exposure settings and results, allowing for easy reference and retrieval. Finally, the CCD camera is used for mask alignment, ensuring precise exposure of photomask to the desired area. The model is equipped with a variety of features that provide optimum control over exposure parameters. These include an adjustable focus to ensure precise exposures and an integrated auto exposure equipment for automatic exposure control that ensures consistent results. Furthermore, the exposure system is designed with safety in mind, featuring an interlock unit to prevent incorrect exposure settings. EFOS A4000 exposure machine is capable of supporting a wide range of applications, including semiconductor fabrication, photolithography, and displays. Additionally, the tool is capable of handling a variety of photomask formats and wafer sizes, making it ideally suited for almost any application. To sum up, A4000 exposure asset is an advanced model designed to provide precise control over exposure during semiconductor fabrication. Featuring adjustable focus, an integrated auto exposure equipment, and a variety of features for safety and accurate results, this system is ideal for almost any application. This unit is capable of handling a variety of photomask formats and wafer sizes, making it the perfect choice for anyone looking for a precise level of control over exposure.