Used EXFO / EFOS IQ-203 #9152167 for sale

EXFO / EFOS IQ-203 is an advanced exposure equipment created by the engineering experts at EXFO Instruments. This system is designed for sub-25 nanometer critical dimension (CD) line/space measurements. EXFO IQ-203 utilizes an automated prober and 3-axis positioning platform to ensure accurate and repeatable exposure performance. The exposure unit also features an integrated automated photoresist coating platform for materials with high-dielectric constant. EFOS IQ-203 utilizes state-of-the-art optics to deliver consistent, high-resolution imaging. The exposure machine's hardware is designed to withstand and accommodate the high-precision motions required for accurate imaging. The tool utilizes a three-axis servo motorized positioner to precisely and repeatably position the optical components. The X-Y stage has a resolution of 0.1 µm and positional accuracy of 1 µm. The third (Z) axis provides a focus depth of 200 µm with a motion of 0.01 µm precision. Additionally, the exposure asset includes a rotational stage which provides full angular control of substrates with respect to the imaging optics. Moreover, IQ-203 comes with a high-performance imaging model. This equipment utilizes monochromatic or polychromatic lighting with a uniform field of view. It also features a high-resolution digital camera which is capable of producing images with a resolution of up to 3 microns. Furthermore, the exposure system has an integrated auto-focus feature which adjusts the imaging based on the motion of the sample. EXFO / EFOS IQ-203 is also integrated with a precision metrology unit which measures critical dimensions and features on a sample. This machine is equipped with on-board lasers which make it possible to perform rapid non-contact measurements. Additionally, the exposure tool includes an automated control software which allows users to readily set up and monitor the exposure process. Overall, EXFO IQ-203 is an advanced exposure asset designed for high-precision imaging and metrology measurements. Its integrated hardware and software facilitates rapid and accurate measurement of critical features and dimensions on samples. This model is an ideal choice for advanced microelectronics and semiconductor applications.