Used EXP EX-T700 #9308416 for sale

EXP EX-T700 is an exposure equipment designed for mass production of photoelectronic devices. It is suitable for a wide range of production processes such as photolithography, etching, sputtering, metal deposition, and ion implantation. EX-T700 features a beam-shaped gamma source which emits monochromatic light with an energy level of 1,200µW/cm2 and a wavelength range of 150 to 460 nm. Its linear stage has a speed range of 0 to 12.5 Mcps and can accommodate sample sizes up to 12.5 cm x 12.5 cm. The multi-axis alignment system allows for contact and non-contact alignment of samples with a precision of 0.1 µm. EXP EX-T700 has a user-friendly touchscreen interface that allows for programmable exposure times, dose, and other exposure parameters. It also has various safety features such as an emergency shut-off switch, automatic source power reduction, and automatic shutter release during accidents. The unit's unique Focus-Lead optimization feature allows for fast and accurate setting of the beam focal position and reduces the effects of blurring. This ensures that the device is exposed with maximum efficiency and with minimal degradation of the light source. EX-T700 is capable of producing device layers with excellent uniformity. This is due to its advanced control algorithms which allow for precise and repeatable exposures with minimal deviation. Furthermore, the machine is designed to minimize power consumption while producing superior results. EXP EX-T700 has a user-friendly design with a small footprint that makes it suitable for use in both large and small fabrication sites. It is also designed for intricate processes such as support layer deposition, and the processing options are more flexible than in traditional exposure systems. EX-T700 also features an integrated data logging tool which provides information about the asset's performance and the various exposure parameters. This facilitates process optimization and maintains process control. EXP EX-T700 is a highly reliable and cost-effective exposure model. Its quality of performance, safety features, and user-friendly interface make it the ideal choice for high-volume production of photoelectronic devices.