Used HIGHMAX UV-200 #293751573 for sale

HIGHMAX UV-200 is an advanced exposure equipment designed for use in the field of semiconductor process engineering. The system consists of a high-power quartz lamp, a frame and a cooling unit. It offers superior uniformity of UV light exposure up to 200 W/cm². The quartz lamp used in UV-200 has a highly optimized spectrum for superior photolithography and a long lifetime. The frame is composed of high quality materials, ensuring the reliability and stability of the exposure unit. The cooling unit has an embedded heat-dissipation mechanism that significantly enhances the life of the quartz lamp and maintains a consistent working temperature to ensure repeatability and consistency of all exposure processes. HIGHMAX UV-200's features allows for precise control of exposure doses of up to 10nm. The machine also features high accuracy wafer alignment and auto-focusing to enable accurate biasing of UV exposure. The user-friendly graphical interface and intuitive programming setup make this tool easy to use and operate. Additionally, programmable settings enable different exposure modes, exposure curves and other customizable parameters. Moreover, the asset is equipped with a high-resolution CCD camera to capture images in real-time, allowing users to set shutter speed, focus, zoom, shutter area and other parameters when capturing CCD images. The model also features a center-tracking light source to ensure uniform exposure of the entire substrate. The equipment also has protection functions to ensure safe operation of the system, increasing its reliability. UV-200 offers superior performance and superior reliability in a variety of semiconductor process engineering applications. With its wide variety of features, the unit is ideal for applications such as photolithography, microfabrication, laser assisted processing and many others.