Used LG PRI SAES5031 #9301978 for sale

LG PRI SAES5031
Manufacturer
LG PRI
Model
SAES5031
ID: 9301978
Vintage: 2005
Exposure system 2005 vintage.
LG PRI SAES5031 is an advanced digital exposure equipment, designed to meet all the needs of production line requirements. It features a compact design which allows it to fit into any limited workspace in a factory. It is configured to provide high resolution of images without high frequency noise and with crisp edge transitions. This exposure system is capable of providing a high speed of operations, with fast exposure times. It has a minimum cycle time of 5 ms, which enables it to rapidly expose even large amounts of data. The feedback loop provided by the unit allows it to self-adjust exposure parameters to the desired levels. This makes it ideal for rapid manufacturing and prototyping needs. SAES5031 also features automatic wafer loading and unloading for easy operation. This makes it an ideal tool for production lines, allowing it to become a part of the production cycle without the need to manually move wafers around. With automatic wafer loading, it can be set up in minutes and allows production workers to dedicate more time to their task rather than manual handling of the machine. LG PRI SAES5031 also offers a wide range of exposure settings, which makes it suitable for versatile applications. It includes 0.2-micron resolution settings for fine-detail applications as well as 0.5-micron resolution with 256 grey levels for general imaging. The tool additionally supports image acquisition from non-screened masks for hybrid asset applications. Control of the model is done through the user-friendly, touch-screen monitor. When pushing the start button, the equipment will perform an automatic program sequence such that the exposure is initiated. It has an intuitive graphic user interface which allows users to configure exposure parameters according to their needs. SAES5031 is an excellent choice for production lines looking into increasing their output in a timely manner. With its compact size, high speed of operations, automatic wafer loading, varied exposure settings, and intuitive user interface, it is an all-round well-rounded system for any manufacturing and prototyping task.
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