Used MATSUSHITA Anup 5204 #9286451 for sale

MATSUSHITA Anup 5204 exposure equipment is an automated wafer exposure system designed to be used in lithography processes. It contains an automated wafer handler that provides precise location, exposure, and orientation control; a highly accurate laser alignment unit for fast and accurate alignment; and an automated optical proximity correction technology, allowing for automated recognition of defect types and the ability to adjust exposure parameters to compensate for them. The exposure machine features various exposure capabilities, including photomask scanning exposure, reticle scanning exposure, microlithography and e-beam exposure, as well as high- and low-UV exposure modes. The exposure tool also provides pattern recognition and correction capability, enabling it to easily identify and correct for irregularities. Anup 5204 asset is constructed with a high- accuracy wafer stage and wafer handling model that provides precise wafer location and positioning, as well as exposure and orientation control. Additionally, the exposure equipment offers fast and accurate laser alignment, with the ability to adjust alignment and exposure parameters for various lithography processes. To effectively achieve an even exposure across the wafer, the exposure system features optical proximity correction (OPC) technology, which adjusts the exposure characteristics to take into account DFM requirements. This technology allows the exposure unit to recognize and compensate for specific pattern recognition and defect recognition. MATSUSHITA Anup 5204 exposure machine is highly versatile and can be used for a variety of applications, including LCD manufacturing, photomask fabrication, and MEMS fabrication. Additionally, the tool provides a total cost of ownership, making it attractive to cost conscious manufacturers. The asset also offers a user-friendly computer interface, allowing users to set and retrieve data, as well as monitor exposure status and check error messages. The exposure model also can be linked to other fabrication equipment, enabling the connection and sharing of data. Anup 5204 exposure equipment provides a comprehensive wafer exposure solution for a number of process requirements. Not only does it offer precise wafer location and orientation control, it also features an advanced laser alignment system and automated OPC adjustment capabilities. It is also highly versatile, with the ability to be used for various applications. This makes it a great choice for cost-conscious manufacturers looking for an efficient way to create quality products.