Used MIDAS MDA-40FA #9358497 for sale

MIDAS MDA-40FA is a state-of-the-art exposure equipment specifically designed for delivering optimal wafer etch performance. The system is based on MIDAS proprietary Variable Component Ratio (VCR) technology that enables users to precisely set the required parameters for uniform etch profiles and high manufacturing yield. MDA-40FA combines high-performance driving of substrates with improved accuracy in exposure delivery. Its integrated PDS (Plasma Deposition Unit) eliminates the need for dedicated mask and enables substrates to be processed much faster. The machine features a 40-station frame, user-friendly LCD touch screen display, high pressure (6 torr) substrate environment, and computer-based automated process control. MIDAS MDA-40FA allows users to conduct a variety of process operations, including patterning, cleaning, etching, and deposition. It also provides the opportunity to deposit a single-layer film on the substrate. Additionally, the tool offers multiple stock module modules, including an integrated wet clean module and an integrated plasma etching module. The wet clean chamber is equipped with a low pressure environment for automated cleaning while the plasma etching chamber is capable of operating under atmospheric pressures of up to 5 torr. MDA-40FA offers an integrated view of substrate parameters during operation. The single integrated view of the asset facilitates accurate control and monitoring of different parameters including substrate rotation speed, shutter speed, and shutter angle during exposure. The model can also be configured with custom settings to meet specific process requirements. Moreover, the automated control equipment is capable of storing up to 25 processes and provides insight into the materials being used. In addition, MIDAS MDA-40FA enables users to precisely control the exposure dose and maintain uniformity along wafer edges. Its sophisticated design eliminates the need for manual alignment, thereby increasing throughput. Moreover, the system ensures the accuracy of the processes by controlling temperature within the substrate chamber. To sum it up, MDA-40FA is a high-performance exposure unit specifically designed for delivering uniform wafer etch performance. Its advanced technology allows users to precisely set various parameters for increasing throughput and manufacturing yield. The integrated high-pressure environment ensures precise control of substrate parameters during operation. Moreover, the automated control machine provides insight into the materials being used, eliminating the need for manual alignment and increasing throughput.