Used NOVELLUS Vector Sola xT #9390438 for sale

NOVELLUS Vector Sola xT is an advanced exposure equipment designed to meet the exacting needs of lithographic processes used in the semiconductor industry. Vector Sola xT is capable of delivering high-accuracy, high-quality exposure at temperatures of 600°C or higher, with a high-speed, high-resolution pattern overlay that enables production of the most complex structures. The system utilizes an advanced, double-stage optical unit featuring high-accuracy polygon scanning and a super-resolution pattern overlay that enables precision patterning of micron-scale features at high speed. An advanced near-field optical head equipped with proprietary algorithms allows for accurate, high-definition imaging with high contrast. This enhances node uniformity and uniformity across the entire substrate field. The high-speed exposure machine has a total throughput of up to 225 wafers per hour. It is equipped with high-accuracy slit-scanning algorithms and fast field stitching techniques to enable seamless imaging with low distortion. This high throughput ensures shorter cycles time, facilitating more efficient production operations. In addition to its high-speed exposure capabilities, NOVELLUS Vector Sola xT is equipped with advanced vacuum handling tools, which enable fast loading and unloading of substrate. This minimizes the risk of exposure failure due to substrate vibration. It also helps improve throughput and reduce exposure cycle time. Vector Sola xT also features an advanced exposure control tool that enables precise control over exposure parameters. This helps to optimize process results by providing an accurate and reliable imaging solution. The asset also comes equipped with a high-accuracy alignment model to ensure precise exposure alignment, minimizing over- and under-exposure to the substrate. Overall, NOVELLUS Vector Sola xT is an advanced exposure equipment that is designed to meet the exacting needs of lithographic processes in the semiconductor industry. Its high-accuracy polygon scanning, double-stage optical system and super-resolution pattern overlay enable production of the most complex structures at high speed. Its advanced vacuum and alignment systems enable accurate and reliable imaging with low distortion, and its exposure control unit helps to optimize process results.