Used OAI 306 #9124212 for sale

OAI-OAI 306 is a fully automated, computer-controlled exposure equipment which is specially designed for deposition of both metal and dielectric films. It can be utilized for creating large area, uniform and patterned thin films. This advanced deposition technique is equipped with a gas/vacuum mixing valve, an RF sputtering cathode, a DC sputtering cathode, and a substrate holder. The valve is used to accurately control the supply of gas and is employed to introduce reactant gas into the chamber, allowing for precise atomizing of molecules. The sputtering cathodes are powerful source of ions spraying the surface of the substrate, making deposition possible. The temperature is regulated by an in-built thermocouple and a temperature controller that offers accurate setting. OAI-306 can be installed and operated in a single stand-alone configuration or in a multi-chamber vacuum cluster system. It is compatible with either dual powerful plasma sources or a single source, allowing for better process parameter control. The RF and DC power supplies are adjustable from 0.1 to 100 milliamperes and 350 to 3000 volts, respectively, allowing for precise control over the deposition rate and quality. OAI-OAI 306 offers precise control over the film pressure and temperature, making it suitable for oxidization and nitridation as well as creating durable and reliable oxide barriers. The unit includes software that provides for complete automation and monitoring of the process. The software controls the electro-mechanical components, monitors the vacuum machine pressure, sputtering rate, gas concentration, substrate temperature, heater current, etc. with the help of a Graphical User Interface (GUI). OAI-306 works well in a variety of applications, making it suitable for advanced microelectronics, hard facing coatings, corrosion resistant coatings, thermal barrier coatings, decorative finishes and more. This tool is cost-effective, energy efficient and eco-friendly.