Used OAI 358 #293636414 for sale

OAI 358 is an exposure equipment used in lithography and other semiconductor imaging processes. It is a small-format, two-story expositive table design specially tailored for use in small pieces and other sensitive applications. 358 offers a wide range of metals and substrates, creating a first-hand, uninterrupted exposure on large-format and backlit sections. It offers a space for up to 12"x 12" substrates and features a large platform for additional features. OAI 358 contains a high-quality lithographic exposure table equipped with a motorized, stepper-driven table. The motorized table allows for fast and accurate pattern placement, allowing for accurate and efficient alignment during lithographic imaging. In addition, the stepper-driven table accurately governs the exposures of the metal and substrate on the table. This is achieved through a one-step exposing system, complete with eight metal and eight substrate positions, increasing exposure efficiency. 358 also offers a removable, adjustable-height heating unit. The heating table allows for heated cooling and uniform exposure of the metal substrates on the table, creating consistent and repeatable results. Furthermore, OAI 358 includes two 400 - 600nm in-situ photometers, which allow for monitoring of all extreme UV exposure levels. The in-situ photometer's measurements provide the highly accurate exposure readings required for production, ensuring accurate image quality and process reproducibility. Furthermore, 358 includes an air gap of 0.001 - 0.008mm to provide maximum resolution, giving users the highest-quality possible results. Lastly, OAI 358 offers an OAI controller which is composed of a four-line, flexible interface for easy, programmable pattern placement control. This makes for superior automation management of semiconductor imaging processes, as well as programmable pattern placement control through OAI controller. Overall, 358 offers a reliable, efficient and quality-based lithographic expositional solution for production. It helps semiconductor imaging processes achieve the highest-quality results with its many features, motorized table, adjustable-height heating machine, and OAI controller.