Used ORC DXP-3512 #9189059 for sale

ORC DXP-3512 is an exposure equipment designed for producing optical lithography masks. It offers users superior resolution, accuracy, and throughput for maximum performance. It includes a 12-projector system, allowing up to 12 wafers to be loaded into the tool simultaneously. The unit features selectable laser types, including ArF from 248nm to 193nm along with KrF from 248nm to 157nm. This ensures the highest resolution and fidelity for mask replication. It also features a high-resolution digital micromirror device (DMD) with 12,800X12,800 resolution. This increases depth-of-field and autofocuses the dose to reduce exposure errors. DXP-3512 has a high-throughput indexing machine, which indexes wafers with an 8-inch diameter within 2.5 seconds. The maximum scanning speed of the tool reaches 90"/s. Additionally, it supports use of quartz plates, oil slides, and indexing plates with a 10 gr/step resolution allowing users to accurately position the wafers within the asset. The model also features a Java Visual Machine (JVM) software that provides a user-friendly graphical interface. This allows users to easily edit programs and produce a comprehensive set of output reports. Additionally, the software can be easily updated as equipment technology and controllers evolve. ORC DXP-3512 also features advanced safety features. It includes software-based interlocks which eliminate wafer and exposure errors as well as a hardware-based safety interlock system which prevents operator overloads and accidental exposure of laser energy. Overall, DXP-3512 is an advanced exposure unit designed for high-performance mask replication. It offers users high resolution, throughput, and accuracy. It also features selectable laser types, high-resolution DMD, high-throughput indexing machine, easy-to-use software, and advanced safety features. These features make it a reliable and efficient exposure tool.