Used ORC EXP-2050 #9361769 for sale

ORC EXP-2050 is an exposure equipment designed for high performance photolithography applications. It has a modular design and can be used for a variety of exposures including those utilizing a variety of UV, e-beam, and X-ray sources. The system offers a wide range of optimization capabilities, including optical alignment, detector positioning, and chamber temperature control. The unit utilizes a high quality imaging sensor, which gives it a high dynamic range and excellent imaging properties. The imaging sensors also have the ability to detect smaller features, which can result in an improved depth of focus. Additionally, it includes a patented chamber design, which helps in controlling the temperature for all components, while ensuring uniform performance and high reliability. EXP-2050 utilizes a patented intelligent feed-forward control machine that helps it to detect and adjust for even the smallest changes in the exposure parameters and exposure time. Furthermore, it also includes an array of control and analysis tools to enable a detailed understanding of the lithography process. One of the most unique features of ORC EXP-2050 is its variable mask design. By utilizing a 3-dimensional deformable mask, this tool gives you the flexibility to adjust the features based on varying process parameters. This results in a better mask performance and improved lithography results. The exposure process is automated with the integrated software. By utilizing a graphical user interface (GUI), the user can set up, monitor, and control the exposure process from a single interface. Additionally, it offers a cleanroom-friendly design, allowing it to be used in an array of different, confined spaces, even when working with dangerous chemicals. EXP-2050 is easily integrated with existing lithography equipment including steppers and aligners. This makes it a great addition to any existing setup and allows one to get higher resolution and more accuracy out of their asset. Testing requirements are also met with the integrated model, as the advanced metrology functions make it possible to obtain reliable data from all exposures. Overall, ORC EXP-2050 is a robust and flexible exposure equipment designed to provide high performance in order to achieve precise and repeatable lithography results. With its wide range of optimization controls, variable mask design, and automated software, EXP-2050 is an ideal solution for any high-end photolithography needs.