Used ORC HMW 201B 5K #293636467 for sale

ORC HMW 201B 5K is an exposure equipment designed for high-resolution lithographic mask writing applications. The system features 5 kilowatts of laser power and is capable of producing lines and spaces of 5 microns in width and height. It offers full-field exposure across a 200mm mask and can be used for production wafer fabrication. The main components of HMW 201B 5K unit include a laser, spatial filter, beam shaping optics, scanning mirror, mask stage assembly, and a controller. The laser is a 5kW, Q-switched Nd: YVO4 solid-state diode-pump laser that emits in the visible range for lithography and mask writing. The laser can produce accurate, high-resolution lines and spaces down to 5 microns in width and height. The spatial filter machine limits the divergence of the laser beam and facilitates improved parallelism of the beam so that lines and spaces can be accurately written. The beam shaping optics include a 10x telescopic lens, two mirror deflectors, and two 4x telescopes. The scanning mirror directs the laser beam to cover the entire 200 mm wide mask in a single pass. The mask stage is designed to hold the mask in place and move it in a synchronized fashion to facilitate full-field exposure. The controller is designed to provide precision control and input commands to the various components of the tool. It features an easy to use interface and offers a variety of functions for pattern and image data input. This ensures a consistent and reliable uniform exposure over the entire 200 mm mask. ORC HMW 201B 5K asset is highly reliable and resistant to vibration, dust, and contaminants. Its low-profile design and small footprint means that it can easily be integrated into a variety of environments. It is also designed for enhanced user comfort, with a simple and intuitive workflow that requires little to no training. The model is ideal for high-precision lithography and mask writing applications due to its wide range of functions, high resolution, and accurate control. It is used in the production of multiple types of semiconductor devices in addition to innovative new applications.