Used ORC HMW 201B 5K #9384302 for sale

ORC HMW 201B 5K is a high-performance, high-precision exposure equipment designed to yield excellent results for exposure and lithography processes. The system is equipped with a high-magnification objective lens which provides a moderate-numerical aperture and a large filed of view. This makes it suitable for a large variety of exposure applications. The unit has a 5K full-field working area and is able to accurately reproduce pattern images with a 7nm minimum feature size. This results in a highly accurate placement of precise micro-scale features and high-contrast patterns. The machine is also designed to accommodate rapid movement of large fields-of-view, allowing for rapid exposure and data acquisition. The tool is equipped with a proprietary automatic alignment and tracking asset to ensure accuracy and repeatability. The model is capable of detecting fine tolerance changes and can then adjust its parameters accordingly. This greatly reduces reticle positioning errors and maximizes image quality. Additionally, the equipment has a built-in quality control system that monitors the imaging process and can alert the operator of any unsatisfactory results. The unit is also designed to be highly configurable. It is capable of offering adjustable lens parameters, multiple options for illumination sources, and can provide flexibility in exposure times and power levels. This makes it suitable for a wide range of applications, including photomask lithography, nano-imprinting lithography, and a variety of other applications. Finally, the machine is designed with a robust, user-friendly interface. Operators can easily program the tool to achieve the desired exposure results. Automation options are also available and can greatly reduce exposure time while ensuring repeatable imaging results. In summary, HMW 201B 5K is a high-performance, high-precision exposure asset designed for excellent results. With its adjustable lens and multiple illumination options, it can be used in a variety of lithography and imaging applications. The automatic alignment and tracking and built-in quality control model ensure accuracy and repeatability. Lastly, the equipment has a robust user-friendly interface and supports automation for faster exposures and reliable results.