Used ORC HMW 680G-20EC #293636469 for sale

ORC HMW 680G-20EC is a precision exposure equipment designed for accurate and reliable exposure of high resolution, lithographic masks and other imaging formats. The exposure system consists of a 680W xenon-filled reflector, a 20-element quartz condenser and a raster scan head. The unit is capable of producing exposure times as fast as 0.3-0.5 ms and with a maximum resolution of 3.5 microns, it is ideal for high quality lithographic mask production. The machine also features an anti-light over-exposure protection tool, as well as a high output power that is self-adjusting and controlled by a programmable command asset. The model works by using the 680W xenon-filled reflector, a 20-element quartz condenser and the raster scan head to produce the exposure time. The reflector is made of highly polished aluminum with a power factor (PF) of 0.98, making it up to 20% more efficient than other reflectors on the market. The quartz condenser has 20 elements and is designed to provide optimal lighting for high resolution imaging, minimizing light attenuation and producing a uniform distribution of light at the exposure head. The raster scan head then takes a predetermined pixel pattern and rasterizes it on the substrate. The equipment also features a high output power that is self-adjusting and can be adjusted using the manual or automated control system. The manual control unit allows operator to adjust the exposure time and power output manually, while the automated machine can be programmed to adjust the settings automatically. Additionally, the tool has an auto-leveling feature, allowing an operator to increase the exposure time when needed. In addition to its performance, HMW 680G-20EC provides unmatched stability, long-term repeatability, and robustness that make it an ideal choice for production environments. All of the components are designed to withstand extreme temperatures and other environmental changes, providing reliable operation in even the harshest conditions. The asset is designed to produce accurate and consistent exposures, producing repeatable and predictable results even after years of use. Overall, ORC HMW 680G-20EC is an advanced, reliable, and feature-rich exposure model that is optimized for high resolution lithographic mask production and other imaging applications. With its high output power, uncoupled exposure speed, and years of reliable performance, it is an ideal choice for production environments that rely on accuracy and repeatable results.