Used ORC HMW680GW #9255676 for sale

ORC HMW680GW is a proven industry-standard exposure equipment that uses electron-beam technology for a wide variety of applications in the photomask and semiconductor industry. The system is designed to provide precise exposure control and high resolution results with excellent yield, reliability and repeatability. The exposure unit operates using a double deflector machine to provide precise electron beam scanning in both raster and vector modes. The electron beam has a wide dynamic range, a linear output over a wide operating range and excellent repeatability over long cycles. The high voltage power supply is stable and linear, and the tool's acceleration voltage is programmable. The built-in power supply and the asset's fast scan rate make this an ideal choice for high-throughput applications. ORC HMW 680GW features an intuitive user interface and provides users with an easy-to-follow graphical interface. Model performance can be monitored and managed through a comprehensive set of indicators and safety features that can be set up, customized and monitored. The equipment's hierarchical storage system (HSS) and open platform provide flexible access to various types of mask data, allowing for complete user control over the data format and storage options. The open platform provides support for a range of different types of data including spot, vector and area-exposure data in various formats. The unit features a real-time model database which can be accessed and analyzed to ensure the highest level of machine performance. The tool's integrated wafer handling asset includes a wafer cassette, as well as a wafer stage that is designed for maximum wafer integrity and accuracy. The model has an advanced process-gas module to ensure efficient and controlled exact wafer process conditions. The equipment offers an option to have an onboard robotic-arm module that allows for simple mask application to the wafers. HMW680GW is an ideal choice for various exposure requirements in the photomask and semiconductor industry. With its advanced and user-friendly features, this exposure system is one of the most reliable and efficient solutions for achieving superior yield, quality and productivity.