Used ORC HMW680GW #9384301 for sale

ORC HMW680GW exposure equipment is one of the most advanced state-of-the-art tools available for photomask makers. It uses a highly specialized form of excimer laser technology to create the extremely fine patterns on photomasks. With its compact size, high productivity, and excellent results, it is an invaluable tool for photomask manufacturers and research labs. The system incorporates an advanced excimer laser source coupled with a high-precision optical mask stage. The laser source utilizes Xenon gas and the exposure wavelength is typically 248nm; in addition, the pulse repetition rate is adjustable from 5kHz to 25kHz. It is user-adjustable to vary a range of exposure depths from 50nm to more than 1um. The exposure unit also features an advanced autofocus machine that utilizes laser interferometry in order to quickly and accurately focus the laser beam onto the photomask. The autofocus tool is coupled with a high-accuracy stage for xy-stage positioning in order to further ensure the accuracy and stability of the mask exposure. In addition to its outstanding laser-driven exposure capability, ORC HMW 680GW also supports exposure of light-sensitive materials via photolithography and sizaigefuro. This allows users to make use of a range of common light sources, such as up-to-date arc lamps, as well as specialized light sources such as deep UV LEDs. HMW680GW exposure asset offers a high degree of control and accuracy over the exposure parameters. This allows users to fine-tune the exposure parameters according to their needs, even when working with challenging substrates such as very thin wafers. Furthermore, the model also includes a variety of automated features that allow for a more efficient, faster and convenient workflow. Overall, HMW 680GW exposure equipment provides photomask makers and research labs with a powerful tool to produce high-quality patterns on photomasks. Its versatile performance and high-end features such as autofocus and user adjustable laser pulse rate enable efficient production of photomasks with extremely fine patterns. The system is well-suited for research and development, as well as production labs.