Used ORIEL 87350 #9392773 for sale

ORIEL 87350 Exposure Equipment is an exposure system designed for photolithographic processes for semiconductor substrates such as masks, wafers, and photocells. This unit uses a focused beam of UV light to expose photoresists, establishing the desired pattern for further etching and circuit fabrication. 87350 features a microscope, image alignment machine, and beam alignment tool. The microscope allows for alignment between wafer and mask patterns, enabling exact registration of patterns on each wafer. The image alignment asset is used to align the image on the palladium and quartz without fear of misalignment. The beam alignment model is used to ensure that the beam entering the wafer is in the exact focal point. ORIEL 87350 also features a high precision stepper motor, which is used to move the beam and adjust exposure time. The motor can be set for various speeds, ensuring that the exposure time is within the optimum range for the best results. Additionally, 87350 includes a monitoring equipment, which monitors the light intensity and maintains a constant beam intensity. ORIEL 87350 also has a variety of safety features. These include the Exhaust Control System, which allows for continuous monitoring of process by-products. It also features an automatic shutoff unit, which cuts off the equipment in case of an emergency. The machine also features a temperature monitor, which warns of any temperature change abnormal. 87350 is a powerful and reliable exposure tool, capable of meeting the demands of photolithography processes. It features a variety of safety features, allowing for consistent, accurate exposure results. Additionally, it is equipped with a high precision stepper motor, allowing for accurate exposure time and intensity settings. ORIEL 87350 is an ideal choice for those requiring precision exposure for their semiconductor substrates.