Used PANASONIC ANUP5252L #9374982 for sale

PANASONIC ANUP5252L is an automated wafer exposure equipment that provides consistent, repeatable results when exposing a wafer to an ultraviolet (UV) light source. This system is designed to support a wide variety of lithography processes, including deep ultraviolet (DUV) projection semi-conductor photolithography. ANUP5252L utilizes an automated, platform-based wafer alignment unit to ensure a precise and repeatable wafer exposure. This alignment unit uses an interferometer to measure wafer height with a detection accuracy of 1 micron, assuring that the wafer is aligned with the exposure unit for optimal results. The machine allows for pre-set exposure time parameters and supports increased yield by preventing overlaps or missed areas when exposing multiple wafers. PANASONIC ANUP5252L features a UV focusing lens from PANASONIC, which ensures uniform field intensity during the exposure process. This advanced lens is designed to produce uniform intensity across the entire wafer surface, reducing errors and optimizing the exposure process. The lens can be used for an variety of exposures, including contact, proximity, and soft contact lithography, as well as scanning and stepped lithography. The tool is equipped with a vacuum chuck that securely holds substrates during exposure. The chuck uses a low-pressure vacuum interface that maintains +/-15% uniformity across the wafer's surface, reducing distortion and ensuring accurate and repeatable exposure. The asset's software also features auto-restore and cross-calibration functions, providing a smart and stable platform for a variety of lithography applications. ANUP5252L is designed for high performance and yield in industrial environments. The model's robust construction, combined with state-of-the-art monitoring and control features, help ensure an optimal exposure every time. Additionally, the equipment includes a wide range of automated safety features, including emergency stop and protective hoods that prevent light leakage. As a result, PANASONIC ANUP5252L provides reliable and repeatable exposures that help minimize variation and ensure that wafers meet precise lithography specifications.