Used SANYO / TOTTORI LPM 2006W-1 #9354054 for sale

SANYO / TOTTORI LPM 2006W-1 is a large projection lithography exposure system intended for wide-site or medium-field applications. Designed with high resolution and high throughput in mind, it is a suitable choice for fabs working on several lithographic processes. SANYO LPM 2006W-1 uses an advanced illuminator and includes a range of features to enable efficient operation. An ultra-low light level light source is featured for accurate focus acquisition and a quad-channel control processor produces highly reliable and efficient exposure alignment. The illuminator is capable of emitting high-intensity beams for rapid throughput as well as low-intensity beams which reduce the time needed for accurate focus acquisition. For improved precision, TOTTORI LPM 2006W-1 is equipped with several optics supporting a wide range of numerical apertures (NA) and wavelengths. This includes an adjustable five-element refractive, multi-wavelength, laser scan and high-resolution imaging optics. Furthermore, a 100-millisecond electron-beam pulse and a new digital power supply unit (PSU) are featured, allowing the intensity to be controlled based on the contours of the mask. Control of the wafer placement is achieved through a high-accuracy stage, which features full six-axis positioning, direct-drive and reduced motion resonance. The six-axis stage also incorporates thermal-imaging cameras for detecting mask patterns and is interfaced to a wafer-handling system, providing precision wafer alignment, and automatic handoff of wafers. In terms of maintenance, LPM 2006W-1 requires very little in the way of maintenance. This is enhanced by the inclusion of tapered roller bearings as well as online diagnostics that can identify problems before they become serious. Additionally, an auto-clean feature is featured, allowing particles to be quickly removed from sensitive optics. Overall, SANYO / TOTTORI LPM 2006W-1 is an excellent choice for fabs looking for an efficient and precise step towards lithography production. With its high resolution, high throughput and user-friendly design, it is more than capable of handling a wide range of application needs.