Used SEIWA PA-920V-INL-5 #9293008 for sale

SEIWA PA-920V-INL-5 is a highly advanced and sophisticated exposure equipment for photomask production. The system is designed to produce masks with features of 0.5 µm or smaller. It features a full-range LCD touch screen with 10.4-inch display for easy control of the unit's functions. This user-friendly machine provides a variety of exposure options and recipes that can be tailored to meet the needs of the customer. PA-920V-INL-5 features an evaporated film deposition source to layer the chromium plate with an optimized resist layer. This provides improved resolution and higher diffraction energies which results in a better quality imaging of the photomask. The deposition source is also able to cover the entire area of the plate, eliminating the need to use manual masking. The tool is equipped with an electronic plotter and LED exposure source. The plotter is designed to accurately plot and create patterns in the chromium plate prior to exposure. The LED exposure source utilizes the latest in advanced technology to provide reliable and uniform illumination. This allows for precision imaging of the patterns that were created prior to exposure. A unique feature of SEIWA PA-920V-INL-5 is its sophisticated vacuum asset. The vacuum enables not only for a better uniform resist layer thickness on the substrate but also for an improved eyepiece observation of the exposed plates. With the vacuum model, PA-920V-INL-5 has the capability to automatically detect the level of vacuum pressure, which results in an improved forming of the photomask. SEIWA PA-920V-INL-5 can be used with a variety of contact masks and grinding disks to provide the ideal polishing conditions. This allows for uniform polish of the photomask in accordance with the customer requirements. The equipment can also be used with a multi-processing chamber and an acid etching unit for further precision control. With the state of the art technology incorporated in PA-920V-INL-5 exposure system, photomask needs as small as 0.5 µm can be consistently and effectively produced. The unit is designed for ease of use and maximum flexibility all in one package. It integrates sophisticated vacuum and optimization processes to provide superior photomask production quality at an affordable price.