Used SEIWA PA-920V-INL-7 #9293010 for sale

SEIWA PA-920V-INL-7 is an exposure equipment designed for photomask production in the semiconductor manufacturing process. It is a stepper-scanner platform with a 6" square photomask stage and a dual 11" Exactrail table, allowing for large photomask size and high throughput. The system offers resolution as high as 0.25 μm and utilizes a high-intensity, split-field, quad storage-tube, deep-UV projection optics unit for exposure. The machine integrates a high-precision motion control tool to achieving higher positioning precision and optimized jerkless motion. With a scan up to 2.3 seconds across its 8" image fields, the asset is designed to reduce the complexity of large photomask production. Its advanced exposure algorithm options allow it to handle even the most intricate of shapes. The model can be set up for a variety of uses, such as short exposure time, laser direct write and mixed mode exposure. Its modular design allows for fast changeover between different exposure applications and the ability to upgrade easily to new process demands. In addition, the equipment boasts a long life even through continual usage. PA-920V-INL-7 is equipped with advanced features such as auto-focus, application-specific alignment and auto-exposure optimization. Auto-focus combines focus optical shape recognition and focus measurement for superior accuracy and repeatability. The alignment module, on the other hand, automatically aligns photomasks according to their inherent design features. The auto-exposure module allows the system to optimize the exposure parameters for each layer of the photomask being produced. The unit offers comprehensive post-exposure inspection and analysis capabilities. It offers a 3D wafer reconstruction and a hot spot detection machine to ensure yield excellence. It also provides extensive data logging capabilities, allowing operators to track critical parameters during production run. The tool can be connected to multiple peripheral devices, such as additional inspection cameras and metrology accessories, to further ensure quality control. SEIWA PA-920V-INL-7 is a highly reliable and cost-effective exposure asset for photomask production. With its advanced features and capabilities, this model eliminates the hassle and time associated with photomask production. It allows for high throughput, superior accuracy and repeatable performance, making it an ideal solution for modern semiconductor fabrication.