Used SVG Micrascan III #9212227 for sale

SVG Micrascan III is a state-of-the-art digital imaging and exposure equipment for the photomask industry. This exposure system utilizes one of the most advanced lithography processes available today. This unit allows for the design and production of extremely small features for improved resolution and overall accuracy of the masks produced. Micrascan III utilizes 157nm wavelength technology to expose features with higher resolution and exposure precision for patterning masks for advanced photolithography applications. This machine is capable of producing features at minimum half-pitches of 32nm and a minimum line width of under 10nm in a single exposure. SVG Micrascan III is equipped with many features to ensure superior imaging and exposure quality. The tool includes a fast and efficient projection lens asset, as well as an upgraded alignment and re-alignment model for improved run-to-run performance. The equipment is also equipped with a high-power pulse laser, which ensures maximum exposure output to precisely expose even the smallest feature sizes and critical dimensions. Micrascan III system also integrates intelligent process management and control software. This software provides users with visibility and control over a wide range of parameters, ensuring accurate, consistent results with each job run. The unit also contains an optimized visual machine that offers a range of viewing options, from microscopic monitoring to automated fine-adjustment of pattern placement. SVG Micrascan III is suitable for use in clean room environments, and offers extremely accurate and repeatable results. This tool is designed for heavy-duty industrial exposure applications, resulting in consistent, high-yield production. Micrascan III is the ideal choice for high-quality photomask production and patterning needs.