Used TAKATORI TUV-1 #293651817 for sale
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TAKATORI TUV-1 is an advanced exposure equipment that is capable of significantly enhanced exposure performance and unsurpassed reliability. TUV-1 is a multi-purpose system that is suitable for a variety of applications such as thin film technology, photoresist lithography, thin film deposition, thin film etching, and CMP. This unit consists of a state-of-the-art exposure source, a high-resolution wafer stage and a precise sample-holding machine. TAKATORI TUV-1 exposure source produces a highly uniform broad spectrum of UV wavelengths, including the deep-UV range. This broad spectrum of UV light is essential for a wide range of applications, such as thin film technology and photoresist lithography. The exposure source also features an energy level control tool, allowing for precise control of energy levels over the entire exposure field. The wafer stage provides highly precise translation of the sample and allows for accurate alignment of the sample relative to the exposure source. It supports a variety of sample sizes, ranging from 2 inch square to 20 inch square. The wafer stage is also equipped with an automated wafer centering feature that further enhances exposure precision. The sample-holding asset ensures high exposure accuracy, even when the sample size varies. The model includes an adjustable sample-holding stage that can be accurately positioned to accommodate a variety of sample sizes. The sample-holding stage also supports self-centering of the sample to ensure accurate alignment of the exposure field. TUV-1 is equipped with an intuitive data acquisition software, which provides a comprehensive set of analysis tools for data analysis and visualization. The software allows users to automatically create exposure programs and to adjust exposure parameters. It also features an edge detection tool for precise measurements of the exposure field. TAKATORI TUV-1's high performance and reliability make it an ideal choice for a wide range of applications. The exposure source's uniform broad spectrum, the wafer stage's precise translation, and the sample-holding equipment's adjustable sample-holding stage, all work together to ensure accurate exposures, regardless of sample size, for a wide range of applications. The intuitive software also makes TUV-1 an outstanding choice for exposure studies and data analysis.
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