Used ULTRA OPTICS MR3 #9305723 for sale

ULTRA OPTICS MR3 is an exposure equipment designed by ULTRA OPTICS, Inc. for photolithography processes used in semiconductor production. It uses a short wavelength of extreme ultraviolet light (EUV) to project patterns onto a silicon wafer. The system can expose patterns in different sizes and resolutions, and can be used to create a variety of complex semiconductor devices. The exposure unit consists of three elements: the source, the projection optics, and the mask. The source produces the EUV radiation, which is focused into a tight, narrowly-defined beam by the projection optics. The mask, which holds the pattern to be exposed, is placed in the path of the beam. The light source used by MR3 is an EUV laser produced by a relativistically-electron-bunched laser. This laser emits light with a wavelength of 13.5nm - much shorter than the visible spectrum - and has a beam diameter of 0.6mm. This wavelength is sufficiently short that it can penetrate through the high resistivity layers of a silicon wafer, allowing patterns to be etched onto the substrate. The projection optics, which serve as a lens for the EUV beam, are designed for high resolution projection. They are made up of a series of magneto-optical and multilayer-coated mirrors and lenses that focus the beam onto the wafer. The focal length of the optics can be adjusted to vary the size of the projected pattern. The mask, which is composed of an array of reflective metal patterns, is the key component in the machine. It is placed in the path of the beam, such that the patterns are projected onto the wafer. The patterns themselves, which may be simple shapes or more complex designs, are selected based on the desired outcome. Together, these three components - the source, the optics, and the mask - make up ULTRA OPTICS MR3 exposure tool. As one of the most advanced EUV exposure systems on the market, it is capable of producing complex semiconductor devices with exceptional speed and detail. The asset can be used to create a wide variety of transistors, logic gates, and other components used in the fabrication of semiconductor integrated circuits.