Used USHIO PE-250D3NP #9128108 for sale

USHIO PE-250D3NP is a high quality exposure equipment, designed for use in the photolithography process used throughout the semiconductor industry. It features a 375-watt super high pressure metal halide pulsed arc lamp for the highest levels of illumination, enabling tight process control and low cycle times. It also offers superior patterning accuracy for the most complex processes, and its stable and repeatable performance make it ideal for use in both wafer and reticle exposure. The system is composed of several main components, a light source, a projection lens, a reticle stage, and an exposure stage. The light source consists of the power supply and lamp, which emits a high intensity light. The projection lens is a high-precision optical lens, capable of projecting a detailed image onto either wafer or reticle material. The reticle stage holds the substrate and moves the mask pattern underneath the lens for projection onto the substrate. The exposure stage is controlled by a computer, and moves the wafer material in the requisite pattern, and also focuses the lens for a clear image. PE-250D3NP is capable of achieving a numerical aperture (NA) of 0.250, with a range of magnification from 5x to 40x. With a field of view of 1.4x1.9mm, the projection image size has a range of 0.25um to 2.0um, making it suitable for a wide variety of processes. In addition, the 4x3 format allows for three individual exposure zones within the same field of view, which enables faster process cycles and higher source output efficiency. The unit is user-friendly and highly configurable. The Control Panel, which can be either mounted to the machine or remotely operated, can be used to control all major operations. Furthermore, the built-in diagnostics allow for continual monitoring of progress, and alarms alert operators when changes in parameters have occurred. Overall, USHIO PE-250D3NP is an ideal exposure tool for applications requiring the utmost accuracy and precision in the photolithography process, and is especially useful when performance challenges arise. With its superior patterning accuracy, stable and repeatable performance, and fast cycle times, PE-250D3NP is an excellent choice for advanced photolithography applications.