Used USHIO PE-250DMV2 #293629206 for sale

USHIO PE-250DMV2 is an advanced exposure equipment ideal for Rapid Thermal Processing (RTP) and annealing applications. This system is designed to be highly reliable and accurate in the temperature control of substrates and wafers. PE-250DMV2 features a high-precision laser thermal sensor, a high-heat accuracy of 0.1 °C, and an optimized scanning speed of 0.3 seconds per wafer rotation. The unit is built with faster heating capability, helping improve productivity while ensuring consistent product quality. USHIO PE-250DMV2 is equipped with a wide-range power supply, making it capable of processing a wide variety of wafers sizes up to 4 inches in diameter. It is also designed for flexible temperature control, allowing for highly optimized thermal flow and substrate temperature control. Another notable feature is the improved sample chamber design, which improves uniformity in temperature distribution. This is essential for creating surfaces that are contamination-free, uniform in application, and repeatable in performance. Additionally, the chamber design is also known to improve machine stability and accuracy when undergoing different operating conditions. In addition, the tool has a short processing time as its rapid heating on-board configures and cools quickly. It also offers increased service life for the asset overall. The control capabilities of PE-250DMV2 are highly intuitive and highly customizable, allowing for quick and easy operation. It has a range of control parameters that make it simple to configure and adjust the temperature, power level and scan rate easily. In addition, the model is capable of controlling multiple wafers at once and maintaining multiple work-zone settings. USHIO PE-250DMV2 is designed for optimized process performance and improved yield. Its built-in safety features, compliance with safety standards, and user-friendly design further make it an ideal choice for RTP and annealing applications.