Used USHIO PE-250R2FP #9358980 for sale

USHIO PE-250R2FP is an efficient and reliable exposure system specifically designed for microelectronics, flat panel display, and roll-to-roll processes. It features a UV LCD light source, precision fan speed controls, and advanced safety controls to ensure optimal processing results and user safety. PE-250R2FP utilizes a three-stage light source comprising a 365nm UV LCD, a 475nm UV LED, and a 525nm Blue LED. This three-stage light source provides consistent and precise irradiation, while offering printing speeds that are faster than screens. Additionally, it includes a high-resolution linear stepper motor, which allows for accurate and precise exposure times. Furthermore, USHIO PE-250R2FP also provides a continuously adjustable and programmable fan speed control to ensure consistent image exposure. PE-250R2FP also contains several safety features that ensure user and equipment safety. It is armed with an integrated safety system that includes preset and programmable exposure times, to prevent overexposure. It also includes an overtemperature safety circuit, as well as a temperature and humidity sensor, to ensure the safe operation of tooling and process temperatures. In addition, USHIO PE-250R2FP also provides an intuitive user interface with adjustable parameters for further customization of the exposure process. It allows users to easily set illumination patterns, angles, and exposure process parameters, so they can achieve the desired results for any application. This user interface is designed to be user-friendly and easily adaptable, allowing users to efficiently customize the exposure process with minimal effort. PE-250R2FP is an efficient and reliable exposure system designed for microelectronics, flat panel display, and roll-to-roll processes. It utilizes a high-resolution linear stepper motor, as well as fan speed control and safety controls, to ensure precision and safety. Furthermore, it features an intuitive user interface with adjustable parameters, allowing users to easily customize the exposure process for each application.