Used USHIO PE-250T2NY #9111508 for sale

USHIO PE-250T2NY exposure equipment is a reliable, high-performance lithography system designed to deliver accurate and uniform exposure of lithographic patterns with maximum precision. The unit features finely tuned optics and components to produce accurate and reproducible results which is suitable for polymers, photoresist, and resist mask applications. The exposure machine is equipped with a 6-position exposure mask platform with a substrate protection tool, and a 12-position mask drawer for convenient mask storage. The asset is also equipped with a motorized 5-axis X/Y/Z stage with a max scanner speed of 2kHz and a non-volatile dimension memory for automated reproduction of scanning patterns. The exposure model is equipped with a 10x— 500x zoom lens with a laser calibration equipment that allows the precise alignment and adjustment of the lens. The high-speed synchronous stage movement provides precise alignment of the mask with the substrate, regardless of the substrate's size and orientation. The exposure system also features an advanced response algorithm that is designed to provide precision scanning at a wide range of exposure dose levels and a unified interface for easy control of exposure parameters. PE-250T2NY exposure unit is a powerful machine with several advanced features including auto-focus correlation, high-speed scanning and uniform illumination, which are designed to provide precision exposure across the substrate. The tool also features an intuitive user interface for effortless operation and full control of all exposure parameters. The asset includes several safety features such as an auto-shutoff for unused lamps, a motion sensor to detect the presence of a substrate and an anti-vibration mount for stable performance. The hardware is designed for durability with dust-resistant construction and a reliable cooling model. The equipment also contains several software options to customize the system for specific needs and requirements. USHIO PE-250T2NY exposure unit is an advanced and versatile machine for producing high precision and reproducible lithographic patterns for a range of applications. The tool is designed to provide reliable and precise exposure across a wide range of exposure dose levels and offers exceptional operability and intuitive control of exposure parameters.