Used USHIO UFX-2259B-AMB01 #9359375 for sale

USHIO UFX-2259B-AMB01 is an all-purpose exposure equipment designed to provide precise and accurate photolithography processes for the semiconductor industry. It is an ideal machine for producing high-reliability patterns and imaging on various substrates, making it a favorable choice for many applications including medical device manufacturing. The exposure system includes a high-speed scanning mechanism with a wide exposure range, allowing for a variety of products to be produced. UFX-2259B-AMB01 features a large illumination source that is adjustable to provide a uniform light intensity at the surface of the substrate, allowing for reproducible results. It also provides an ultraviolet light source that is used to harden materials during the imaging process. A vacuum unit ensures a proper substrate adhesion to the flatbed surface during the imaging process, allowing for a high definition image result. An enclosed chamber houses the flatbed and ensures that the substrate is protected from dust and other particles during the imaging process. The control software provided with the machine allows for complete control over the exposure settings and parameters. Various settings such as illumination level, speed of the scanning process and exposure area can be programmed to provide tailored results for each substrate. USHIO UFX-2259B-AMB01 also includes a precision alignment mechanism, ensuring that the required target is perfectly aligned on the substrate. UFX-2259B-AMB01 efficiently controls the process of photolithography, allowing for product customized to each specific application from the medical to the electronics industry. Its compact design and adjustable illumination source make it an ideal choice for various applications that require precise and reliable imaging results. Although the tool is designed for professional use, its user-friendly interface makes it a great choice for use in education institutions. This makes it particularly suitable for introducing concepts such as microtechnology and photolithography to students. Overall, USHIO UFX-2259B-AMB01 exposure asset provides users with an effective and efficient imaging solution, providing unparalleled image results for a variety of substrates and applications. Its adjustable illumination source, precision alignment mechanism, and enclosed chamber make it a suitable choice for a variety of industries and educational establishments.