Used USHIO UFX-2259B-AMB01 #9372133 for sale

Name: USHIO UFX-2259B-AMB01
Brand: USHIO
SKU: 9372133
Availability: InStock

URL successfully copied!

Tap to zoom

Photo Used USHIO UFX-2259B-AMB01 For Sale

Exposure Systems

Manufacturer

USHIO

Model

UFX-2259B-AMB01

ID: 9372133

Vintage: 2009

Exposure system, parts machine Shutter unit: Exposure area, P/N; 2317-3246 Mask light source Optical parts: Light collecting mirror, P/N: 2306-3208 Plane mirror, P/N: 2836-7583 Projection lens, P/N: UPL-59EX Microscope, P/N: 1000051733 / 3185-0361 CCD Has been removed Workpiece stage: Beam splitters, P/N: 1000049959 (43.5) Beam splitter, P/N: 1000029070 (11.5) Motor unit (X, Y, Θ), P/N: 3026-0870 Work stage units: Drive shaft pressure wheel unit Drive shaft unit Brake shaft unit Clamp unit Vacuum suction plate Anti-uplifting press wheel group Illumination / Microscope: Light cover light source gate missing Micrometer (Precision sliding table), P/N: MHS2-13 OMROM Rotary encoder, P/N: E6B2-CWZ6C (2000P/R) Reel receiving and discharging mechanism: AC Motor, P/N: VHR206AGVJ / GV2G250 AC Motor, P/N: 2TK3GN-AGN25K Clutch, P/N: AMC-40 (6) Drive / Brake units: MATSUSHITA AC Servo motor (Drive unit), P/N: MSM5AZP1A MATSUSHITA Motor driver (Drive unit ), P/N: MSD5A1P1EA Clutch, P/N: AMC-5 Piping units: SMC Solenoid valve workpiece blow, P/N: VCW31-5G-2-02-V-B-X41 SMC Solenoid valve workpiece vacuum, P/N: VP542R-5GZ-03A-F SMC Solenoid valve workpiece vacuum, P/N: VCW41-5G-4-02-V-B-X27 SMC Solenoid valve workpiece vacuum, P/N: VCW3134V-02-5GS-B PCB: USHIO Auto micrometer, P/N: PB-1026B USHIO Rotary encoder I / F, P/N: HC ENC I/F NDG Switcher, P/N: PB-1028B-U00 Video IN, P/N: RICE-001 Video OUT, P/N: PLUM-001 MELEC Motor control, P/N: C-864V1 Screen / Peripheral: KEYENCE VT-7S Touch panel display is non-functional Mouse for visual teaching PLC: MITSUBISHI CPU Unit, P/N: Q06HCPU MITSUBISHI Serial data unit, P/N: QJ71C24-R2 MITSUBISHI 64-Point IN unit, P/N: QX40 MITSUBISHI 65-Point OUT unit, P/N: QY50 MITSUBISHI 2-Axis positioning unit, P/N: QD75D2 MITSUBISHI High speed counter, P/N: QD62D MITSUBISHI Memory card, P/N: Q2MEM-8MBA MITSUBISHI QJC1724N MITSUBISHI QJ61BT11N Internal wiring; Sensor line / Communication line PC Host: AUPC Air mount: (3) Balance air cushions Static elimination: Ion gun 2009 vintage.

Read More Close

USHIO UFX-2259B-AMB01 is an advanced exposure equipment designed for optical lithography applications. The system offers a high-precision and high-stability exposure process, which is critical for ensuring the accuracy of printed features. It is capable of accurately controlling the shape, size, depth and other microstructure features of the printing elements. The unit comes with a variety of lenses and apertures to adapt to different processes and materials. It is equipped with a high-precision stage to move the wafer to ensure accurate placement of printed features. The exposed wafer is then transferred from the machine to the processing platform for further processing. UFX-2259B-AMB01 allows precise control of the exposure process through an accompanying software package. This software is capable of managing exposure time and power, as well as controlling the various parameters, such as focus and wavelength. It also allows users to monitor temperature, humidity, and air flow during the exposure process. USHIO UFX-2259B-AMB01 also has an advanced computer digital signal processor (C-DSP) to provide consistent accuracy of exposure parameters and a constant temperature within the exposure chamber. The advanced processor also provides diagnostic capabilities and allows remote monitoring of tool performance. The asset is capable of accurately calibrating exposure parameters to ensure process accuracy. It can also evaluate wafer feature shapes to quickly identify potential problems with the printing process. UFX-2259B-AMB01 provides users with detailed exposure log data that can be used for reporting and analysis. The model is equipped with many safety features to monitor different parameters and prevent incorrect process operation. These include a halogen bulb guard and anti-static grounding for the wafer peripheral chucks. The exposure equipment also has a shock absorber system in order to maintain optimal exposure performance in extreme scenarios. Overall, USHIO UFX-2259B-AMB01 is an advanced exposure unit designed for optical lithography applications. It is capable of accurately controlling the shape, size, depth and other microstructure features of the printed elements, as well as providing users with detailed exposure log data for reporting and analysis. The machine also offers numerous safety and performance features to ensure optimum performance.