Used USHIO UFX-2259B-AMB01 #9375526 for sale

ID: 9375526
Vintage: 2009
Exposure system, parts machine Shutter unit: Exposure area, P/N; 2317-3246 Mask light source Optical parts: Light collecting mirror, P/N: 2306-3208 Plane mirror, P/N: 2836-7583 Projection lens, P/N: UPL-59EX Microscope, P/N: 1000051733 / 3185-0361 Workpiece stage: Beam splitters, P/N: 1000049959 (43.5) Beam splitter, P/N: 1000029070 (11.5) Motor unit (X, Y, Θ), P/N: 3026-0870 Work stage units: Drive shaft pressure wheel unit Drive shaft unit Brake shaft unit Clamp unit Vacuum suction plate Anti-uplifting press wheel group Illumination / Microscope: Light cover light source gate Micrometer (Precision sliding table), P/N: MHS2-13 OMROM Rotary encoder, P/N: E6B2-CWZ6C (2000P/R) Reel receiving and discharging mechanism: AC Motor, P/N: VHR206AGVJ / GV2G250 AC Motor, P/N: 2TK3GN-AGN25K Clutch, P/N: AMC-40 (6) Drive / Brake units: MATSUSHITA AC Servo motor (Drive unit), P/N: MSM5AZP1A MATSUSHITA Motor driver (Drive unit ), P/N: MSD5A1P1EA Clutch, P/N: AMC-5 Piping units: SMC Solenoid valve workpiece blow, P/N: VCW31-5G-2-02-V-B-X41 SMC Solenoid valve workpiece vacuum, P/N: VP542R-5GZ-03A-F SMC Solenoid valve workpiece vacuum, P/N: VCW41-5G-4-02-V-B-X27 SMC Solenoid valve workpiece vacuum, P/N: VCW3134V-02-5GS-B PCB: USHIO Auto micrometer, P/N: PB-1026B USHIO Motor interface, P/N: PB-1017B USHIO Motor interface, P/N: PB-1018B USHIO Rotary encoder I / F, P/N: HC ENC I/F USHIO Shutter control, P/N: PB-1040B NDG Switcher, P/N: PB-1028B-U00 Video IN, P/N: RICE-001 Video OUT, P/N: PLUM-001 MELEC Motor control, P/N: C-864V1 Screen / Peripheral: KEYENCE VT-7S Touch panel display PLC: MITSUBISHI CPU Unit, P/N: Q06HCPU MITSUBISHI Serial data unit, P/N: QJ71C24-R2 MITSUBISHI 64-Point IN unit, P/N: QX40 MITSUBISHI 65-Point OUT unit, P/N: QY50 MITSUBISHI 2-Axis positioning unit, P/N: QD75D2 MITSUBISHI High speed counter, P/N: QD62D MITSUBISHI Memory card, P/N: Q2MEM-8MBA MITSUBISHI QJC1724N MITSUBISHI QJ61BT11N Internal wiring; Sensor line / Communication line PC Host: AUPC Air mount: (4) Balance air cushions ULVAC DA-60S Vaccum pump Static elimination: Ion gun 2009 vintage.
USHIO UFX-2259B-AMB01 is an exposure equipment designed for use as part of a lithographic or photomask imaging process. It utilises a novel combination of technologies to provide accurate, consistent, and repeatable exposure. The system includes a proprietary imaging engine, which provides the main source of illumination. This comprises a mercury arc quartz photo-cathode lamp with an emission line of 248nm and a four-phase shutter unit for controlling exposure timing. It is capable of exposing up to 5500 wafers per hour at an exposure power level of up to 10 mJ per cm2. The lamp has a lifetime of up to 2000 hours before needing to be replaced. Additionally, the machine includes a designed optical platform, which provides the main optics in the tool. This utilises a combination of reflective mirrors and a custom designed condenser lens to ensure that the light is correctly focused onto the wafers being exposed. This guarantees that the exposure will be of a consistent quality without any variance in terms of intensity or focus. Finally, the asset also includes an automated control model, which is used to monitor and control the exposure process. This is able to provide detailed information on the exposure process, such as exposure times, number of wafers exposed, average exposure level, and more. It also includes an onboard safety equipment that automatically shuts down the system should any anomalous readings be detected. Overall, UFX-2259B-AMB01 is a highly advanced, reliable, and easy to use exposure unit which is ideal for use in a lithographic or photomask imaging process. It provides precision control over the exposure process, and its combination of technologies make it highly accurate, consistent, and repeatable every single time.
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