Used USHIO UMA-1002-HC93FS #9083276 for sale

USHIO UMA-1002-HC93FS is an exposure equipment that enables users to obtain accurate, precise exposures and uniformity across all dimensions. This type of exposure system consists of the latest higher-powered lamps and their advanced UMA optical design which ensures a better and consistent exposure. The exposure unit consists of a high voltage and high luminescence power source, such as a lamp, a beam-shaping optical design that focuses the light beam with accurate thin beams, and a controller. The exposure machine enables a user to adjust the distance between the lamp and the substrate, adjust the intensity of the lamps in each direction (X,Y), and adjust the various irradiance distributions. USHIO UMA 1002-HC93FS is equipped with two high-lumen-per-watt high power lamp which can produce a full area of up to 1500mmx1300mm. Each lamp is capable of outputting 15,000 lux at a distance of 300 - 600mm, and can be adjusted to achieve a uniform brightness. Furthermore, its UMA optical design enables quick and precise positioning and provides a uniform light intensity over the entire exposure area. The exposure tool also features a precise, adjustable timer controller, allowing users to control the exposure time for each UV lamp. The controller offers multiple presets, allowing the user to time their exposure time. Along with its short exposure time ranging from 0.5 to 8 seconds, users can easily optimize their exposures with no risk of accidents or material damage. The exposure asset also includes safety features such as a timer cut off preventing potential overloads. UMA-1002-HC 93 FS is both dustproof and waterproof, and can be installed in a variety of locations, including factory, laboratories, and R&D areas. UMA 1002-HC93FS is an incredibly versatile exposure model that is well suited to many different industries. It provides users with reliable and accurate exposures with no risk of accident or material damage. This enormous exposure equipment is a great tool for anyone requiring a powerful exposure system.