Used USHIO UMA-1002-HC93NM #9096447 for sale

USHIO UMA-1002-HC93NM exposure equipment is a high-performance, state-of-the-art tool for photolithography of micro-scale and nano-scale devices. This system features an extremely precise, laser interferometry-based alignment unit that utilizes two crosshair beams to ensure accurate alignment and positioning of the photoresist. This ensures highly reproducible results, even when dealing with extremely thin layers of resist. In order to meet the needs of today's next-generation integrated circuits, the machine features a wide range of adjustable parameters to precisely control the ultraviolet exposure process. This includes variable substrates capability and multiple alignment modes. These features enable users to fine-tune the exposure process in order to achieve greater resolution and precise patterning. UMA-1002-HC93NM is equipped with an integrated projection lens tool, which utilizes a high NA objective lens and a state-of-the-art farfield collimator to achieve excellent imaging performance. The projection lens asset also incorporates an adjustable objective lens model for making precise adjustments to the pitch, alignment and focus of the device. USHIO UMA-1002-HC93NM utilizes a UV source of 313 nm, which is tuned for optimal results when working with traditional photoresists. This source can also be used with other high-tech alternatives such as photosensitive polymers and carbon nanotubes. The pick-and-place capabilities of the equipment allow users to accurately position delicate substrates such as quartz, glass, and plastic films. The system features a robust, touch-screen-operated control panel that allows users to easily access and adjust its various parameters. The user-friendly interface also provides monitoring functions to ensure that all parameters are regularly adjusted to maintain optimal performance. Overall, UMA-1002-HC93NM is an advanced and highly reliable unit designed to meet the needs of the modern, high-tech semiconductor industry. This reliable and precise tool features an integrated projection lens machine for outstanding imaging, adjustable parameters for fine-tuning the exposure process, and intuitive touch-screen controls for adjusting settings and monitoring performance.