Used USHIO UMA-2003 #293758116 for sale

USHIO UMA-2003 is an exposure equipment designed for high speed photolithography and imprint lithography applications. It is capable of providing exposure power up to 4 mW/cm2 in the UV, VIS, and near IR spectral bands. It features an advanced optical system consisting of a high numerical aperture (NA) condenser lens and a high NA objective lens. This design allows for high accuracy, high resolution, and short exposure times. USHIO UMA 2003 exposure unit includes an ultra-precision XY stage which is capable of turning to an accuracy of 0.2μm. This makes it suitable for exposure with a wide range of substrates. It is also equipped with an automatic dosing mechanism that allows for precise control of the exposure dose. To further enhance its performance and ensure high shutter speed, the machine also includes a high efficiency cobalt filter wheel and a high speed shutter. This provides optimal exposure parameters to ensure excellent results. The cobalt filter wheel furthermore allows for a wide exposure range in the UV, VIS, and near IR bands. UMA-2003 is powered by an integrated controller which allows for easy operation. It is designed with user-friendly features such as graphical user interface, preset exposure parameters, and a remote control and networking option. The high NA condenser and objective lenses ensure excellent optical performance and yield high resolution results. Additionally, the high efficiency cobalt filter wheel ensures excellent exposure uniformity and low exposure dose. Lastly, the tool provides short exposure times to reduce production cycle times and yield higher throughput for cost efficient production. All together, UMA 2003 provides an ideal exposure solution for high speed photolithography and imprint lithography applications. It features an efficient optical design with high accuracy and resolution, a wide exposure range, as well as precise control of exposure dose. The high efficiency cobalt filter wheel and the high speed shutter ensures excellent exposure uniformity and short exposure times. Lastly, the integrated controller provides easy operation and user-friendly features.