Used USHIO UMA-802-HC551RM #9226136 for sale

USHIO UMA-802-HC551RM is an exposure equipment designed for the semiconductor production process. It is a multi-axis exposure system that utilizes a full aperture optical unit for a wide range of applications and high-precision exposure. The machine features high accuracy and repeatability for precise and uniform exposure. The tool's largest component is the exposure stage, which is a substrate holder that is designed to hold and manipulate substrates during the exposure process. It is designed with 6 degrees of freedom, allowing for full rotation and positioning of substrates and wafer chucks. It is also equipped with a high-accuracy, high-speed servo motor, allowing for minute repeatable positional accuracy and rapid acceleration. The asset also utilizes a laser-driven data encoding model, which is used to accurately manipulate the coordinates of each exposure point. This equipment is designed to provide accurate and instantaneous exposure data, allowing for precise and controlled exposure. The system's optical unit is composed of a high-resolving achromatic lens, along with beam splitters for multiple exposures. This machine is designed to provide excellent uniformity of exposure, with high intensity and low distortion from the achromatic lens. The tool is also designed to be able to handle a wide range of exposure angles, allowing for more precise and accurate patterning and exposure coverage. Lastly, the asset utilizes a high-intensity light source, which provides an optimal level of exposure intensity, resulting in higher throughput and better yield. The model is designed with a variety of input options, including a direct current control equipment, a voltage control system and a laser power control unit. These systems are designed to allow for multiple varieties of exposure control and customization, depending on the user's needs. All of these features of UMA-802-HC551RM make it a highly adjustable and powerful machine. It is designed to provide reliable and repeatable exposures, with a multitude of options for different types of substrates. It is an ideal tool for semiconductor production, due to its reliability and ability to configure exposure settings for optimal yield.